"Solution provider for Rapid Thermal Processing Furnaces & Chemical Vapour Deposition Systems"
Annealsys supplies RTP (Rapid Thermal Processing) Furnaces, RTCVD (Rapid Thermal Chemical Vapour Deposition) Furnaces, MOCVD (Metal Oxide), Spray CVD and LPCVD (Low Pressure) with a focus on both research and university work as well as the semi-conductor industry.
With dozens of years experience in this industry, Annealsys provides innovative equipment set to meet the demands of cutting edge research and production.
- AS-Series cold wall chamber furnaces for RTP and RTCVD Applications up to 1500ºC
- MC Series innovative solution for MOCVD and ALD (Atomic Layer Deposition applications with deposition and annealing inside the same chamber
- Spray Series 2-inch deposition and annealing for laboratories
- LC Series 4-inch low pressure furnace for samll production with single or dual tube furnaces